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Molecular and Cellular Biology, January 2001, p. 185-188, Vol. 21, No. 1
0270-7306/01/$04.00+0 DOI: 10.1128/MCB.21.1.185-188.2001
Copyright © 2001, American Society for Microbiology. All rights reserved.
Requirement of DNA Polymerase
for Error-Free
Bypass of UV-Induced CC and TC Photoproducts
Sung-Lim
Yu,
Robert E.
Johnson,
Satya
Prakash, and
Louise
Prakash*
Sealy Center for Molecular Science,
University of Texas Medical Branch, Galveston, Texas 77555-1061
Received 29 August 2000/Returned for modification 28 September
2000/Accepted 12 October 2000
 |
ABSTRACT |
The yeast RAD30-encoded DNA polymerase
(Pol
) bypasses a cis-syn thymine-thymine dimer
efficiently and accurately. Human DNA polymerase
functions
similarly in the bypass of this lesion, and mutations in human Pol
result in the cancer prone syndrome, the variant form of xeroderma
pigmentosum. UV light, however, also elicits the formation of
cis-syn cyclobutane dimers and (6-4) photoproducts at
5'-CC-3' and 5'-TC-3' sites, and in both yeast and human DNA,
UV-induced mutations occur primarily by 3' C to T transitions. Genetic
studies presented here reveal a role for yeast Pol
in the error-free
bypass of cyclobutane dimers and (6-4) photoproducts formed at CC and
TC sites. Thus, by preventing UV mutagenesis at a wide spectrum of
dipyrimidine sites, Pol
plays a pivotal role in minimizing the
incidence of sunlight-induced skin cancers in humans.
 |
INTRODUCTION |
The UV component of sunlight is a
major epidemiological risk factor for skin cancers that include
melanomas, basal cell carcinomas, and squamous cell carcinomas. In the
United States, the frequency of skin cancers approaches that of all
other cancers combined and is on the rise because of the depletion of
the ozone layer (10, 21, 23). UV-induced DNA lesions are
removed by nucleotide excision repair, but if left unrepaired, they
present a block to normal DNA replication. The yeast RAD30
and human RAD30A genes encode a DNA polymerase, polymerase
(Pol
), which has the unique ability to efficiently and
accurately replicate through a UV-induced cis-syn
thymine-thymine (TT) dimer, and defects in hRAD30A cause the
variant form of xeroderma pigmentosum (12, 13, 16, 22, 27). Xeroderma pigmentosum XPV patients suffer from highly
elevated levels of sunlight-induced skin cancers.
Because of the efficient insertion of As opposite the TT dimer, it has
been suggested that Pol
is an A rule polymerase (8). In
addition to cyclobutane dimers at two adjacent thymines, UV also
induces the formation of lesions at dipyrimidine sites that involve a
cytosine, most commonly at 5'-TC-3' and 5'-CC-3' sequences. In fact,
the 3' cytosine in both sequence contexts is highly mutagenic, and in
both yeast and humans, UV-induced mutations occur primarily by a C
T
transition that would result from the insertion of an A opposite the 3'
damaged C residue during DNA replication (1, 3, 6). If
Pol
were an A rule polymerase which inserts an A residue by default
opposite the various lesions, then the bypass of a CC or a TC
cyclobutane dimer by Pol
would be mutagenic, not error free as for
the TT dimer.
In addition to cis-syn cyclobutane pyrimidine dimers, UV
induces the formation of pyrimidine (6-4) pyrimidinone photoproducts. The (6-4) photoproduct is formed most frequently at a TC site, whereas
the dimer is formed more frequently than the (6-4) photoproduct at a CC
site (2, 4, 5). The C of a cis-syn cyclobutane dimer, however, is quite unstable, and in vitro it deaminates to U
(24, 25), thus making in vitro bypass studies with TC or
CC dimers difficult. Here, we utilize a genetic system designed to test
for the role of yeast Pol
in the bypass of UV-induced lesions at
5'-TC-3' and 5'-CC-3' sites. We find that UV-induced mutations occur at
the 3' C of TC and CC sequences, and importantly, the incidence of
these mutations is about fivefold higher in the rad30
strain than in the wild-type strain. These studies provide evidence for
the requirement of Pol
in error-free bypass of cyclobutane dimers
and (6-4) photoproducts formed at TC and CC sites.
 |
MATERIALS AND METHODS |
Generation of deletions of yeast genes.
All yeast strains
were derived from EMY74.7 (MATa
his3
-100 leu2-3,112 trp1
ura3-52). The rad30
mutation was generated as
described previously (14). To generate the
rev3
mutation, a 4.6-kb DNA fragment containing the
entire REV3 gene was first cloned into pUC19. The internal
3.5-kb Bst11075 fragment of REV3 was then
replaced by the URA3 gene blaster fragment, generating plasmid pPM292. This plasmid, when cut with EcoRI and
BamHI and transformed into yeast, deletes genomic
REV3 from nucleotide +436 to +3928 of the 4,152-bp open
reading frame (ORF). To generate the ura3
mutation,
889-bp and 747-bp PCR products corresponding to the 5' and 3' regions,
respectively, of the URA3 gene were amplified from yeast
genomic DNA and directionally cloned into pUC19. The yeast
HIS3 gene was then inserted between these two PCR products,
generating plasmid pPM1048. This plasmid, when digested with the
restriction enzymes Asp718 and SalI and
transformed into yeast, deletes from nucleotide +24 to +774 of the
804-bp URA3 ORF. Deletions were confirmed by PCR analysis of
yeast genomic DNA. Loss of the URA3 gene derived from the
gene blaster fragment in the various yeast strains was selected
for by plating on medium containing 5-fluoro-orotic acid. To determine
UV-induced reversion frequencies, yeast strains were transformed
to TRP+ with plasmids pPM1020 and pPM1021,
harboring the ura3-210 and ura3-364 mutant
alleles, respectively, which were constructed as described below.
Construction of the ura3-210 and ura3-364
mutations.
Mutations were introduced into the URA3 gene
in pUC19-based plasmid YIplac211 (9) using the MORPH
system site-specific mutagenesis kit (5 Prime
3 Prime, Inc.,
Boulder, Colo.). For the ura3-210 mutation, the
oligonucleotide N4675
(5'-GAAGCATTAGGTCCCAAAATTCGTTTACTAAAAACACATGTGG-3') was
used, and for the ura3-364 mutation, the oligonucleotide
N4676 (5'-CCGCCAAGTACAATTTTTTACCGTTCGAAGACAGAAAATTTGCTG-3')
was used. The ura3-210 mutation is a T
C missense
mutation at position +166 in the URA3 ORF that creates a
Cys56
Arg56 change in the encoded protein.
The ura3-364 mutation is a T
C missense mutation at
position 263 in the URA3 gene. In this case, the mutation
results in a Leu88
Pro88 change in Ura3
protein. The ura3-364 allele also contains a C
G silent
mutation at position 264 within the proline codon that eliminates a
second potential CC site. Both alleles were sequenced and found not to
contain any other mutations. Subsequently, the ura3-210 and
ura3-364 alleles were used to replace the wild-type URA3 allele in the yeast CEN/ARS plasmid YCplac33
(9) containing the TRP1 gene as a selectable
marker, generating plasmids pPM1020 and pPM1021, respectively. The
phenotype of the ura3-210 and ura3-364 alleles
was confirmed by the inability of yeast strains harboring either
pPM1020 or pPM1021 to grow on media lacking uracil and by resistance to
5-fluoro-orotic acid.
UV mutagenesis and sequence analysis of URA3
revertants.
Yeast strains lacking the genomic URA3 gene
(ura3
::HIS3) and harboring plasmid
pPM1020 or pPM1021 were grown overnight at 30°C in synthetic complete
medium lacking tryptophan (SC
trp). Cells were harvested by
centrifugation, washed, and resuspended to a density of 108
cells/ml in sterile H2O, and dilutions were plated on the
appropriate medium. Plates were irradiated with UV light at a dose of 1 J/m2/s under yellow light and incubated for 3 to 5 days at
30°C in the dark. For UV-induced mutagenesis, cells were plated on
SC
trp for viability determinations and plated on SC
trp that also
lacked uracil (SC
trp
ura) to determine reversion frequencies of
ura3-210 and ura3-364 alleles. The frequency of
spontaneous URA3 revertants was subtracted from the
frequency of revertants observed following UV irradiation. To determine
the sequence of revertants induced by UV light, plasmid DNA was
isolated from UV-induced URA3+ yeast colonies,
and the URA3 gene was amplified by PCR. PCR products were
then sequenced in the regions corresponding to the respective mutations
using the thermosequenase kit from Amersham and
-33P-labeled dideoxynucleoside triphosphates.
 |
RESULTS |
To determine whether Pol
is involved in the error-free bypass
of UV-induced TC and CC photoproducts, we designed a genetic assay for
Saccharomyces cerevisiae that utilizes the
ura3-210 and ura3-364 mutant alleles, which
completely inactivate URA3 function (19). The
ura3-210 allele has a T to C mutation at position 166 in the
URA3 gene, and this mutation is in a 5'-TC-3' sequence. The
resulting mutant protein contains an arginine at position 56 instead of
the normal cysteine residue (Fig. 1).
Reversion of this mutant allele to the wild-type URA3 gene
occurs by the incorporation of an A residue opposite the 3' C of the TC
UV-induced lesion, restoring the cysteine codon. The
ura3-364 allele is also a T to C mutation, but at position
263 in the URA3 gene, and this mutation is in a CC sequence.
The mutant protein contains a proline at position 88 instead of leucine
(Fig. 1). The ura3-364 allele also reverts to the wild type
by the incorporation of an A opposite the 3' C of the CC UV-induced
lesion, but reversion of this allele can also occur by the
incorporation of two As opposite the two Cs in the CC sequence.

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FIG. 1.
Reversion assay for ura3-210 and
ura3-364. The region of the URA3 gene
corresponding to the ura3-210 and ura3-364
mutations is shown. The asterisk indicates the position of a T C
mutation. The amino acid substitution in each mutant is circled.
Following UV irradiation, a TC photoproduct in ura3-210 or a
CC photoproduct in ura3-364 can be formed and is shown in
bold with a caret over it. Replication across either lesion by the
insertion of an A residue opposite the 3' C results in reversion of the
alleles to a Ura+ phenotype.
|
|
The ura3-210 and ura3-364 alleles were
incorporated into a low-copy-number yeast plasmid containing the
TRP1 gene for selection. Wild-type, rad30
,
rev3
, and rad30
rev3
yeast
strains lacking the genomic URA3 gene but harboring the
mutant ura3 gene on a plasmid were irradiated with UV light,
and the frequency of URA3 revertants was determined. As
shown in Fig. 2, UV sensitivity was
increased in rev3
and rad30
single mutants,
and the UV sensitivity of the rad30
rev3
double mutant was greater than that of the single mutants, consistent
with the involvement of the RAD30 and REV3 genes
in alternate pathways for bypassing UV lesions. UV irradiation induces
the reversion of the ura3-210 allele in both the wild-type
and rad30
strains. However, at all UV doses, the reversion frequency was about fivefold higher in the
rad30
strain than in the wild type (Fig.
3), indicating a role for Pol
in the
incorporation of the correct G residue opposite the 3' C residue in TC
photoproducts. These UV-induced mutations depend upon the REV3 gene, since few or no mutations occurred in the
rad30
rev3
strain (see the legend to Fig.
3). Sequence analysis of 32 independent revertants from the wild-type
and rad30
strains revealed that all UV-induced mutations
occur by a 3' C to T change (Table 1), indicating the incorporation of an A opposite the 3' C.

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FIG. 2.
Survival after UV irradiation of various yeast strains
lacking the genomic URA3 gene and harboring the plasmid
pPM1020, which carries the ura3-210 mutation. Cells were UV
irradiated and plated on SC trp for viability determinations. Each
curve represents the average of three independent experiments. Symbols:
, wild type; , rev3 ; , rad30 ; ,
rad30 rev3 .
|
|

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FIG. 3.
UV-induced reversion of the ura3-210 allele
in wild-type (white bar), rad30 (gray bar), and
rad30 rev3 yeast strains. Yeast strains
lacking the genomic URA3 gene and harboring plasmid pPM1020,
which carries the ura3-210 mutation, were UV irradiated, and
the average frequency of URA3 revertants was determined from
results of three independent experiments. Spontaneous mutation
frequencies ranged from 0.1 × 10 7 to 1 × 10 7 for the various experiments and were similar for the
different strains. The standard error is shown for each
determination. The frequency of UV-induced revertants at 5, 10, 15, and
20 J/m2 for the rad30 rev3
strain was 1 in 107. Also, few or no UV-induced
revertants were observed for the rev3 strain.
|
|
The ura3-364 allele containing the CC sequence also reverts
in a UV dose-dependent manner (Fig. 4).
In this case, however, the frequency of revertants was about fivefold
lower than that for the TC sequence in ura3-210. In both
yeast and mammalian cells, UV-induced TC photoproducts are often much
more mutagenic than the CC photoproducts (1, 3, 6). This
may be due to the more frequent formation of (6-4) photoproduct at the
TC site than at the CC site (2, 4, 5). UV-induced
reversion of ura3-364 was four- to fivefold higher in
the rad30
strain than in the wild-type strain (Fig.
4), indicating a role for Pol
in the accurate bypass of CC
photoproducts. Again, few or no UV-induced revertants were formed in
the rad30
rev3
strain (Fig. 4). In both the
wild-type and rad30
strains, as was observed for the
TC sequence, reversion of the CC sequence also occurs by a 3' C
T
change, indicating the incorporation of an A opposite the 3' C (Table
1). In two cases for the wild-type strain, however, a C
T mutation
was additionally observed at the 5' C in the CC sequence. The
occurrence of a tandem CC
TT mutation was also observed for
the rad30
strain (Table 1).

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FIG. 4.
UV-induced reversion of the ura3-364 allele
in wild-type (white bar), rad30 (gray bar), and
rad30 rev3 (hatched bar) strains. Yeast
strains lacking the genomic URA3 gene and harboring plasmid
pPM1021, which carries the ura3-364 allele, were UV
irradiated, and the average frequency of URA3 revertants was
determined from results of three independent experiments. Spontaneous
mutation frequencies ranged from 0.05 × 10 7 to
0.2 × 10 7 for the various experiments and were
similar for the different strains. The standard error is shown for each
determination. No UV-induced revertants were observed for the
rad30 rev3 strain at 5, 10, and 15 J/m2. Also, few or no UV-induced revertants were observed
for the rev3 strain.
|
|
 |
DISCUSSION |
We have developed a genetic system to measure the frequency of
UV-induced mutations at the 3' C of 5'-TC-3' and 5'-CC-3' sequences and
find that the incidence of these mutations is about fivefold higher for
the rad30
strain than for the wild-type strain. These data provide strong evidence for a role of Pol
in the error-free bypass of UV lesions at TC and CC sites. The (6-4) photoproduct is
formed more frequently at the TC site, and the cis-syn
cyclobutane dimer is formed more frequently at the CC site (2, 4,
5); thus, these results indicate a role for Pol
in the
error-free bypass of cyclobutane dimers and of (6-4) photoproducts at
these sites. Hence, the ability of Pol
for error-free bypass of UV lesions is not restricted to the TT dimer.
These observations also have a bearing on the role of cytosine
deamination in UV mutagenesis of CC and TC sites in eukaryotic cells.
In Escherichia coli, such deamination has been proposed to
account for the C
T transitions which then occur because of accurate
insertion of adenines opposite uracils resulting from cytosine
deamination (26). If Pol
were to replicate through uracil-containing dimers by inserting an A opposite a U, as it does so
efficiently for the TT dimer, in that case, inactivation of Pol
should reduce the frequency of UV-induced mutations at the TC and CC
sites. The fact that 3' C
T transitions rise approximately fivefold
in the rad30
strain indicates that Pol
bypasses UV lesions at these sites by inserting the correct nucleotide G opposite the Cs. Also, the almost absolute requirement of
REV3-encoded Pol
for C
T transitions at these sites
points to the active involvement of this polymerase in the mutagenic
bypass of TC and CC photoproducts wherein an A is incorporated opposite
the 3' C. Thus, in eukaryotic cells, cytosines in dimers must persist
long enough for Pol
- and Pol
-dependent damage bypass to occur.
A number of physical studies have indicated that a cis-syn
TT dimer has only a modest effect on DNA structure, and this distortion does not affect the ability of the two Ts in the dimer to base pair
with As (7, 11, 18). By contrast, a (6-4) TT photoproduct induces a large structural distortion in the DNA helix, and the 3' T in
this lesion is perpendicular to the 5' T (17, 20). Nuclear
magnetic resonance studies have also indicated that the O2
carbonyl of the 3' T in the (6-4) TT lesion can form a stable hydrogen
bond with the imino and amino protons of an opposed G residue
(20). The (6-4) lesion at the TC site is expected to be
structurally very similar to that at the TT site, and the O2 carbonyl
of the 3' C in the TC (6-4) lesion is also predicted to form a hydrogen
bond with the G residue. Incorporation of a G opposite the 3' C
by Pol
would result in error-free bypass of a TC (6-4) lesion. In
support of this premise, our steady-state kinetic studies with purified
yeast and human Pol
indicate that they both insert a G opposite the
3' T of the (6-4) TT photoproduct fairly efficiently, but Pol
is
unable to insert the subsequent nucleotide; Pol
then inserts an A
opposite the 5' T of the lesion, thereby completing the bypass
process (R. E. Johnson, L. Haracska, S. Prakash, and L. Prakash,
unpublished observations). Similarly, opposite a (6-4) TC photoproduct,
we expect Pol
to insert a G opposite the 3' C and Pol
to extend
by inserting an A opposite the 5' T of this lesion. The sequential
action of Pol
and Pol
will then coordinate the error-free bypass
of (6-4) TC photoproducts. Thus, although Pol
would function in an
error-prone manner in the bypass of the rare (6-4) TT photoproduct, it
would promote error-free bypass of the more frequently formed (6-4)
photoproducts at the TC site and those formed at the CC site. The
insertion of a nucleotide by Pol
opposite the 3' site in the (6-4)
photoproduct suggests that its active site can conform to the severe
distortion conferred upon DNA by this lesion.
By analogy to the efficient and accurate bypass of a
cis-syn TT dimer, we expect Pol
to bypass a
cis-syn CC or TC cyclobutane dimer by inserting the
correct nucleotides opposite the two residues of the dimer. The ability
of Pol
to promote accurate bypass of a cis-syn
cyclobutane dimer or a (6-4) photoproduct at the TC and CC sites shows
that Pol
is not an A rule polymerase, inserting an A opposite UV
lesions by default. Further, our observation that UV-induced
reversion at TC and CC sites in both the wild-type and
rad30
strains occurs by a 3' C
T mutation indicates
that a DNA polymerase other than Pol
is responsible for the
incorporation of an A residue opposite the 3' C of photoproducts.
Although, and as expected, UV-induced mutagenesis at both the TC and CC sites is nearly abolished in the rev3
or the
rad30
rev3
strains, REV3-encoded
DNA polymerase
may not be the enzyme which inserts the A residue
opposite the 3' C in these photoproducts, because Pol
is highly
inefficient at inserting nucleotides opposite the 3' site of these
lesions (15). Instead, Pol
functions in the subsequent
step of elongating from the base incorporated opposite the lesion by
another DNA polymerase (15).
Yeast and human Pol
resemble each other in structure and function,
and steady-state kinetic analyses have indicated that they both bypass
a cis-syn TT dimer with the same efficiency and fidelity as
through undamaged Ts (16, 27). Genetic studies presented
here support a role for yeast Pol
in the error-free bypass of TC and
CC photoproducts, and they suggest a similar role for human Pol
.
Thus, by preventing UV mutagenesis at a wide spectrum of dipyrimidine
sites, Pol
plays an indispensable role in minimizing the incidence
of sunlight-induced skin cancers in humans.
 |
ACKNOWLEDGMENTS |
S.-L.Y. and R.E.J. contributed equally to this work.
This work was supported by NIH grant GM19261.
 |
FOOTNOTES |
*
Corresponding author. Mailing address: University of
Texas Medical Branch, Sealy Center for Molecular Science, 6.104 Medical Research Building, 11th and Mechanic Streets, Galveston, TX 77555-1061. Phone: (409) 747-8601. Fax: (409) 747-8608. E-mail:
lprakash{at}scms.utmb.edu.
 |
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Molecular and Cellular Biology, January 2001, p. 185-188, Vol. 21, No. 1
0270-7306/01/$04.00+0 DOI: 10.1128/MCB.21.1.185-188.2001
Copyright © 2001, American Society for Microbiology. All rights reserved.
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